Growth and percolation of thin films: A model incorporating deposition, diffusion and aggregation

Pablo Jensen*, Albert Lásló Barabási, Hernán Larralde, Shlomo Havlin, H. E. Stanley

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract (may include machine translation)

We propose a model for describing diffusion-controlled aggregation of particles that are continually deposited on a surface. The model, which incorporates deposition, diffusion and aggregation, is motivated by recent thin film deposition experiments. We find, that the diffusion and aggregation of randomly deposited particles "builds" a wide variety of fractal structures, all characterized by a common length scale L1. This length L1 scales as the ratio of the diffusion constant over the particle flux to the power 1/4. We compare our results with several recent experiments on two-dimensional nanostructures formed by diffusion-controlled aggregation on surfaces.

Original languageEnglish
Pages (from-to)227-236
Number of pages10
JournalChaos, Solitons and Fractals
Volume6
Issue numberC
DOIs
StatePublished - 1995
Externally publishedYes

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