A fractal model for the first stages of thin film growth

Pablo Jensen*, Albert László Barabási, Hernán Larralde, Shlomo Havlin, H. Eugene Stanley

*Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract (may include machine translation)

In this paper, we briefly review a model that describes the diffusion-controlled aggregation exhibited by particles as they are deposited on a surface. This model allows us to understand many experiments of thin film deposition. In the Sec. 1, we describe the model, which incorporates deposition, particle and cluster diffusion, and aggregation. In Sec. 2, we study the dynamical evolution of the model. Finally, we analyze the effects of small cluster mobility and show that the introduction of cluster diffusion dramatically affects the dynamics of film growth. Some of these effects can be tested experimentally.

Original languageEnglish
Pages (from-to)321-329
Number of pages9
JournalFractals
Volume4
Issue number3
DOIs
StatePublished - Sep 1996
Externally publishedYes

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